ECR-PECVD相关论文
利用电子回旋共振-等离子体增强化学气相沉积(ECR-PECVD)技术,以氮气为等离子体气源,硅烷为前驱气体在玻璃衬底上低温沉积了氮化硅......
多晶硅薄膜以其优异的光电性能和较低的制备成本，在能源信息工业中，日益成为一种重要的电子材料，并被广泛应用于大规模集成电路和半导......
In this paper, polycrystalline silicon films were deposited by electron cyclotron resonance plasma-enhanced chemical vap......
Polycrystalline silicon (poly-Si) films were deposited using Ar diluted SiH4 gaseous mixture by electron cy-clotron reso......
