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对多靶离子溅射制备的Nb/Si周期多层膜的微结构进行了实验研究。利用X射线衍射和截面透射电子显微镜观测到室温和 56 0℃沉积的Nb/Si多层膜为非晶多层膜 ,但它们的微结构有很大的不同。采用沉积原子表面活动性和界面反应程度解释了所得到的结果。
The microstructure of Nb / Si multilayered films prepared by multi-target ion sputtering was studied experimentally. The Nb / Si multilayer films deposited at room temperature and 56 ℃ were observed as amorphous multilayer films by X-ray diffraction and cross-section transmission electron microscopy, but their microstructures were very different. The results obtained are explained by the depositional atomic surface activity and the extent of interfacial reaction.