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对Ar气氛下射频溅射所镀铬钼合金膜，采集不同组分配比的俄歇电子能谱，经平滑、扣除本底处理，得出随铬钼相对比例改变的变化规律。根据俄歇电子跃迁的准原子模型，对谱峰进行曲线拟合，得出铬钼合金膜并非铬钼的单纯机械混合，其外层电子发生了某种转移，利用高斯曲线对所得俄歇谱拟合后，对每个俄歇峰按成分比进行面积归一化，细致分析后得出钼的N_(23)轨道电子数增多，钼的M_(45)，N_1，N_(23)和价带发生变化及移动，并且有一些3d电子从Cr转移到Mo的4d轨道上。而且运用带非负约束的退卷积和退自卷积等新的分析方法，首次利用AES获得了几种不同配比CrMo合金膜的价带态密度分布。
The Ar-Au sputtering sputtered chromium-molybdenum alloy film was used to collect Auger electron spectra of different compositions. After smoothing and background subtraction, the variation of the relative proportions was obtained. According to the Auger electron transition quasi-atomic model, the peak fitting curve, drawn chromium-molybdenum alloy film is not purely mechanical mixing of chromium and molybdenum, the outer layer of the electron some shift, the use of Gaussian curve Auger spectrum After fitting, the area of each Auger peak was normalized according to the composition ratio. After detailed analysis, it was found that the number of orbital electrons in molybdenum increased, the M_ (45), N_1, N_ (23) The band changes and moves, and some 3d electrons move from Cr to Mo’s 4d orbit. In addition, using the new analysis methods such as deconvolution and deconvolution with nonnegative constraints, the density distributions of valence band states of several different CrMo alloy films were obtained by AES for the first time.