PbS能应用于制造激光用的Q转换开关及高效率太阳能吸收薄膜,澳大利亚P.J.Martin等人用1500eV氩离子在真空系统中作整块PbS靶的离子束溅射制取PbS薄膜。 他们用一个2.5cm的Kanfman离子源,沉积期间氩压力为1×10~(-4)mmHg,溅射靶是纯度为99.999％的整块PbS盘,靶面上流强密度为10～20mA/cm~2。薄膜沉积在1μm厚的铝基涂层上,此涂层在尺寸为20mm× PbS can be used in the manufacture of laser Q-switches and high-efficiency solar energy absorbing films. P.J. Martin et al., Australia produced PbS films by ion beam sputtering using a 1500 eV argon ion in a vacuum system as a bulk PbS target. They used a 2.5 cm Kanfman ion source with an argon pressure of 1 × 10 -4 mmHg during deposition. The sputtering target was a monolithic PbS disk with a purity of 99.999%. The target density was 10-20 mA / cm ~ 2. The film was deposited on a 1 [mu] m thick aluminum-based coating that was in the size of 20 mm x