In this paper, next-generation lithography (NGL) for the 22 and 16 nm technology nodes and beyond is reviewed. A broad r......

In this work,a 90-nm critical dimension(CD) technological process in an ArF laser lithography system is simulated,and th......

The laser-induced damage threshold(LIDT) of optical coating is a limited factor for development of a high peak power las......

国际光学工程学会(The International Society for Opticsl Engineering),原名光学与光学仪器工程师学会(Society of Photo-Optic......

国际光学工程学会ＳＰＩＥ与中国光协、中国光学学会建立长期密切合作关系国际光学工程学会主管学术活动与展览会的技术部主任Ｒａｉ－Ｃｈｏｕｄｈｕｒｙ于１９９４年１１月访问北......