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本文考察了工艺参数对离子束增强沉积（IBED）氮化硅、氮化钛薄膜的成分和微观组织的影响。测定了薄膜的硬度以及薄膜与基体之间结合力，分析了成分和结构与薄膜的硬度和结合力的关系。考察了在不同载荷和速度条件下St_3N_4、TiN薄膜和52100钢试样的摩擦系数和耐磨性。结果显示，与无膜的52100相比，IBEDSt_3N_4和IBEDTiN的耐磨性成倍提高。探讨了薄膜的磨损机理。
The effects of process parameters on the composition and microstructure of silicon nitride and titanium nitride films grown by ion beam enhanced deposition (IBED) were investigated. The hardness of the film and the bonding force between the film and the substrate were measured. The relationship between the composition and structure and the hardness and cohesion of the film was analyzed. The friction coefficient and wear resistance of St3N4, TiN film and 52100 steel under different loadings and speeds were investigated. The results showed that the wear resistance of IBEDSt_3N_4 and IBEDTiN increased exponentially compared with that of 52100 without membrane. The wear mechanism of the film was discussed.