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采用等离子体增强化学汽相沉积薄膜型SnO_2的方法,研究了不同掺杂浓度及衬底温度对成膜的影响,用能带论估算了表面吸附原子密度,并测量了元件对石油气、氢气的灵敏度。
The influence of different doping concentration and substrate temperature on the film formation was investigated by plasma-enhanced chemical vapor deposition (CVD) of thin film SnO2. The energy density of surface adsorbed atoms was estimated by energy band theory. Sensitivity.