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提高金属蒸汽真空弧(Metal Vapor Vacuum Arc,MEVVA)离子源注入机的注入效率,大幅度降低注入成本是MEVVA源离子注入技术实用化的关键。为此开展了100型MEVVA源注入机大批量的工件注入均匀性的研究。本文介绍了100型MEVVA源注入机的靶室结构和靶盘分布,研究了0°定位自转、靶盘公转自转、45°定位自转的注入离子浓度分布。这三种方式的注入离子浓度分布都不能满足大批量均匀注入的需要。但45°定位自转的注入离子浓度分布的趋势与另两种相反,这意味着将45°定位自转与0°定位自转或靶盘公转自转相结合进行复合注入,可以得到均匀的注入效果。通过对几种注入方式的拟合计算来确定复合注入的注入比例。最后通过实验研究了靶盘不同运动状态的复合注入,得到了相当均匀的注入效果。
Improving the injection efficiency of Metal Vapor Vacuum Arc (MEVVA) ion source implanter and reducing the injection cost significantly are the key to practical application of MEVVA source ion implantation technology. To this end, the 100-type MEVVA source implanter was used to study the uniformity of workpiece injection. In this paper, the target chamber structure and target disk distribution of the 100-type MEVVA source implanter are introduced. The ion concentration distribution of implanted ions at 0 ° orientation rotation, target rotation and 45 ° orientation rotation is investigated. The three methods of ion concentration distribution can not meet the needs of high volume and uniform injection. However, the tendency of the ion concentration distribution at 45 ° orientation rotation is opposite to that of the other two. This means that a uniform injection effect can be obtained by combining the 45 ° orientation rotation with the 0 ° positioning rotation or the rotation of the target disk. Through the calculation of several injection methods to determine the injection of composite injection ratio. Finally, experiments were carried out to study the composite injection of different movement states of the target disk, and a fairly uniform injection effect was obtained.