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本文讨論适用于产生强电流密度电子注的电子槍的設計和工作性能(注电流密度为200amp/cm~2)。同时还討論由均匀磁場聚焦的圆柱形电子注流。着重叙述电子槍的設計。另外还談到由空間电荷限制的电子槍以及皮尔斯設計方法的工作原理,包括用在很高的注电流密度时,所必然出現的限制情况和必要的修正。我們还提出由电子槍阳极孔造成的电場畸变的部分补偿方法。我們也将描述由于电子发射的热速度所引起的在电子槍設計上的限制和在注中的影响。本文描繪了研究电子槍和电子注工作性能所应用的实驗技术,同时也介紹这些研究中所获得的某些結果。这些技术包括对电子注特性的詳細測量。比如,在有或无磁場存在的情况下的电流密度和横向速度的分布。这些测量指出了根据簡单原理所得到的电子流的許許多多偏差。
This article discusses the design and performance of an electron gun suitable for generating electron beams of high current densities (current densities of 200 amps / cm ~ 2). At the same time, cylindrical electron injection focused by a uniform magnetic field is also discussed. Focus on the design of the electron gun. The working principle of electron guns and Pierce design methods, which are limited by the space charge, is also talked about, including the limitations and necessary corrections that are necessary at very high current injection densities. We also propose a partial compensation method of electric field distortion caused by the anode hole of the electron gun. We will also describe the limitations in electron gun design and their effects in the annotation due to the thermal velocity of electron emission. This article describes the experimental techniques used to study the performance of electron guns and electron guns and also presents some of the results obtained in these studies. These techniques include a detailed measurement of the electronic injection characteristics. For example, the distribution of current density and lateral velocity in the presence or absence of a magnetic field. These measurements point to the many deviations of the electron flow obtained according to the simple principle.