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本文就真空溅射沉积碳化钛的工艺和应用简要地作了介绍。结果表明沉积温度可以在600℃以下,每小时沉积1微米,碳化钛沉积层表面显微硬度可达3000kg/mm~2。试样经 x衍射结构分析确为碳化钛相;经金相和电镜分析,TiC 层和基体结合情况良好;经电子探针分析,在 TiC 层和基体间 Ti 和 W 元素、Ti 和 Cr 元素确有共同分布的区域存在。在硬质合金刀具,焊接硬质合金刀具,高速钢刀具和用二次硬化处理的冷冲模的生产应用上均取得显著效果。文内还比较了二极溅射和三极溅射的工艺特点,讨论了三极溅射工艺参数间的关系。
This article briefly describes the process and application of vacuum sputtering deposition of titanium carbide. The results show that the deposition temperature can be below 600 ℃ and deposit 1 μm per hour. The microhardness of the surface layer of titanium carbide deposit can reach 3000 kg / mm ~ 2. The sample was confirmed by X-ray diffraction analysis of the structure of titanium carbide phase; by metallographic and electron microscopic analysis, TiC layer and substrate bonding well; by electron probe analysis, in the TiC layer and matrix Ti and W elements, Ti and Cr elements There is a common distribution area. In the carbide cutting tools, carbide cutting tools, high-speed steel cutting tools and secondary hardening with the production of cold die have achieved remarkable results. The article also compared the characteristics of the two-pole sputtering and three-pole sputtering process, discussed the relationship between the three-pole sputtering process parameters.