本文的目的是比较如下一些方法淀积薄膜的化学剂量、密度、耐腐蚀性和光谱漂移。这些方法有:一般的反应蒸发、带有射频等离子体的反应蒸发,以及磁控溅射方法。研究中采用的膜料有一氧化硅、一氧化钛和熔石英等。它们是可见和近红外区多层膜系中常用的材料。实验薄膜淀积A700Q真空镀膜机的简图示于图1,真空 The purpose of this article is to compare the chemical dose, density, corrosion resistance and spectral drift of the deposited films with some of the following methods. These methods include general reactive evaporation, reactive evaporation with radio frequency plasma, and magnetron sputtering methods. Materials used in the study are silica, titanium oxide and fused quartz. They are commonly used materials in the visible and near-infrared multilayer systems. Experimental film deposition A700Q vacuum coating machine schematic is shown in Figure 1, vacuum