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低压下沉积ｃ－ＢＮ薄膜是近年来凝聚态物理和材料科学研究的热门课题之一．我们应用热丝辅助射频等离子体化学气相沉积技术，在多种衬底上沉积了ＢＮ薄膜，并系统研究了热丝温度、衬底温度和射频电压等工艺参数对ＢＮ薄膜中立方相含量的影响．
The deposition of c-BN thin films at low pressure is one of the hot topics in condensed matter physics and material science research in recent years. We apply hot wire assisted RF plasma chemical vapor deposition technology to deposit BN thin films on a variety of substrates and systematically study the effects of process parameters such as hot wire temperature, substrate temperature and RF voltage on the cubic phase content in BN films .