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在离子渗氮和离子渗碳这样的等离子扩散过程中,除温度、气体成份、气体压力及气体流量等常规工艺参数外,等离子功率密度或等离子流密度具有重要意义。可以证明,离子渗氮时,等离子功率密度对化合物层厚度的影响尤其显著;离子渗碳时,碳的迁移强烈地依赖于所控制的等离子功率密度值。介绍了等离子扩散处理时用以稳定等离子流密度的控制系统。一导言等离子体用于表层化学热处理过程,多年来已众所周知。离子渗氮早自70年代就已进入工业应用,且目前己得到了最广泛的采用。
Plasma ionization and ion carburizing such plasma diffusion process, in addition to temperature, gas composition, gas pressure and gas flow and other conventional process parameters, the plasma power density or plasma flow density is of great significance. It can be shown that the plasma power density has an especially significant effect on the compound layer thickness when ion nitriding; the migration of carbon strongly depends on the controlled plasma power density values during ion-carburization. The control system to stabilize the plasma flow density during plasma diffusion treatment is introduced. I. INTRODUCTION The use of plasma for surface chemical heat treatment has been well known for many years. Ion nitriding has been in industrial applications since the 1970s and has been the most widely adopted.