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与热扩散、外延晶体生长或电镀、电解研磨,化学腐蚀等热反应和化学反应的方法相比,先使元素和化合物离化然后在真空或低压范围内加以利用的方法正受到重视,这是一种物理的方法,包括离子注入、溅射、离子镀膜、离子腐蚀等于式工艺。离化的目的有的在于利用负电压加速使离子增加动能,有的在于由于离化使物质化学活泼性增加而容易发生化学反应。可以说,利用上述之中一个效应或同时利用两个效应,都能有效运用物体本身的性质。
Methods of ionizing elements and compounds first and then utilizing them under vacuum or under low pressure are gaining attention as compared to thermal and chemical reactions such as thermal diffusion, epitaxial crystal growth or electroplating, electrolytic polishing, chemical etching and the like A physical method, including ion implantation, sputtering, ion plating, ion etching is equal to the process. Some of the purpose of ionization is to accelerate the use of negative voltage ions to increase kinetic energy, and some is due to the ionization of the material to increase chemical and chemical reactivity prone to chemical reactions. It can be said that the use of one of the above effects or the simultaneous use of both effects can effectively use the nature of the object itself.