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超导Josephson隧道结是实现超导量子比特的基本元件.本文介绍了一种利用电子束曝光技术和电子束斜蒸发技术相结合的方法来制备铝超导Josephson隧道结.这种方法工艺简单,通过一次光刻就可完成;而且可以通过调节下层光刻胶厚度、斜蒸发角度、悬空桥区宽度等参数可以有效地控制隧道结的面积大小;此外,本方法通过采用不对称电极结构有效地改善了隧道结的漏电流特性,满足了制备超导量子比特的要求.
The superconducting Josephson tunnel junction is the basic element to realize the superconducting quantum bit.In this paper, a method of electron beam lithography and electron beam oblique evaporation is introduced to fabricate the superconducting Josephson tunnel junctions.This method has the advantages of simple process, And can be completed by one photolithography. Moreover, the area of the tunnel junction can be effectively controlled by adjusting parameters such as the thickness of the photoresist in the lower layer, the angle of oblique evaporation, and the width of the suspended bridge. In addition, by using the asymmetric electrode structure effectively Improve the tunnel junction leakage current characteristics, to meet the requirements of the preparation of superconducting qubits.