在自制的弯曲法测定氧化膜应力装置上,分别在400～500℃温度范围内,研究了 Nb 及 Nb752合金(Zr 2.5.W10%wt)在一个大气压纯氧中所生成的氧化膜的生长应力、热应力以及金属基体溶解氧对应力值的影响.发现合金元素 Zr 与 W 含量分别达2.5% wt 及10%wt 时对氧化膜应力无影响。X-射线衍射分析证明,这是由于实验条件下,Nb752合金与纯铌的氧化膜组成相同,均由 Nb_2O_3单相构成. The growth stress of the oxide film formed by the Nb and Nb752 alloy (Zr 2.5W10% wt) in one atmosphere of pure oxygen was studied in a self-made bending stress device for the oxide film by measuring the temperature in the range of 400-500 ℃. , Thermal stress and dissolved oxygen on metal matrix were investigated.The stress of oxide film was not affected when the contents of Zr and W were 2.5% wt and 10% wt, respectively. X-ray diffraction analysis proved that this is due to the experimental conditions, Nb752 alloy and pure niobium oxide film composed of the same, composed of Nb 2 O 3 single phase.