论文部分内容阅读
用磁控溅射方法在聚合物薄膜基体上制备出不同厚度的纳米 Ｔｉ膜．扫描隧道显微镜（ＳＴＭ）的观察结果表明，初期膜是由直径小于２ｎｍ的形核粒子和粒子团聚体组成．粒子沉积呈岛状生长形成纳米晶粒结构随薄膜厚度增加，平均晶粒尺寸增加，形成大尺寸晶粒的连续薄膜.分析和讨论了薄膜生长过程的结构特征及溅射条件对薄膜结构的影响．
Magnetron sputtering method was used to prepare nano-Ti films with different thickness on the polymer film substrate. Scanning tunneling microscope (STM) observations show that the initial membrane is composed of nucleation particles and particle agglomerates of less than 2 nm in diameter. The formation of nanocrystalline grains grows as islands and the average grain size increases with the increase of the film thickness, forming a continuous thin film of large-size grains.The structural characteristics of the film growth process and the influence of sputtering conditions on the film structure are analyzed and discussed .