离子溅射自 1852年被 Crove[1]研究以来,至今已发展成为一种用途颇广的技术.如清洁固体表面、溅射淀积薄膜、制作微电子线路、加工光学器件、侵蚀金相样品及制作透射电子显微镜薄箔样品等.后两者现已成为研究物质微观组织结构的手段之一.四十年代末,有人用溅射法侵蚀锻件的“流 Ion sputtering has been a widely used technique since it was studied by Crove [1] in 1852. It has been used to clean solid surfaces, sputter deposit thin films, fabricate microelectronic circuits, process optics, erode metallurgical samples And the production of thin-film transmission electron microscopy samples, etc. The latter two have now become one of the means of study of the material microstructure.40s, some people use the sputtering method forging erosion of the "flow