本文所介绍的SnO_2、In_2O_3薄膜是以透明导电膜的形式出现的,但它在红外高反射特性和可见区高透射特性方面引起了极大的注意。因此它们又是可见与红外很有用的材料。一、SnO_2和In_2O_3膜的制造方法关于它们的制造方法,国外报导很多,有化学法(CVD法)和物理法(PVD法),物理方法主要是溅射法和真空蒸发法。这里主要介绍真空蒸发法。 The SnO 2, In 2 O 3 thin films presented in this paper are in the form of transparent conductive films, but they attract a great deal of attention in the infrared high reflection and high transmittance in the visible region. So they are again very useful materials that are visible and infrared. First, the production of SnO_2 and In_2O_3 film on their manufacturing methods, many foreign reports, there are chemical methods (CVD method) and physical method (PVD method), the physical method is mainly sputtering and vacuum evaporation method. Here mainly introduces the vacuum evaporation method.