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作者用自己改装的椭圆偏振光谱仪在可见光范围内研究了射频溅射非晶态硅薄膜的光学性质;提出能同时确定薄膜折射率实数部分n和消光系数K的实验方法;对不同生长条件的薄膜进行测量,获得n与K随λ变化的资料.
In this paper, the optical properties of RF sputtering amorphous silicon thin films were investigated in the visible range with the help of a modified elliptical polarization spectrometer. The experimental method of simultaneously determining the real part n and the extinction coefficient K of the refractive index of the film was proposed. Measured to obtain n and K with the λ changes in the information.