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高精度光刻掩模的制造技术:在透明玻璃基板上用正性或负性光致抗蚀剂涂敷。使光致抗蚀剂形成图案,则要注入适当的离子,例如~(31)P~+、~(40)Ar等,随注入剂量的增大,抗蚀剂膜发生硬化变质(碳化黑化)对紫外线起掩蔽作用,同时,耐化学试剂的性能和机械强度都显著提高,能耐强酸和有机溶剂,具有和氧化铬同等的机械强度。用离子注入处理后碳化,黑化了的光致抗蚀剂图案成为光刻掩模的暗区。象~(49)BF_2~+这样的复数原子的离子也可以注入。在加速电压,剂量相同的情况下,离子质量越大效率越高。一方面、玻璃基板能被离子注入而无变化,光刻掩模的透明区对紫外光和可见光是一样的从而获得高精度掩模。
High-precision lithography mask manufacturing technology: a transparent glass substrate with a positive or negative photoresist coating. For patterning of the photoresist, appropriate ions such as ~ (31) P ~ +, ~ (40) Ar and the like are implanted, and the resist film is hardened and deteriorated as the implantation dose increases ) Shields against UV rays and at the same time significantly improves chemical resistance and mechanical strength, withstands strong acids and organic solvents, and has the same mechanical strength as chromium oxide. The carbonized, blackened photoresist pattern is ion implanted into the dark area of the lithography mask. Ions like ~ (49) BF_2 ~ + complex atoms can also be implanted. In the case of accelerating voltage and dose, the higher the mass of ions, the higher the efficiency. On the one hand, the glass substrate can be ion-implanted without change, and the transparent region of the lithography mask is identical to the UV and visible light to obtain a high-precision mask.