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采用磁控溅射法在C/C复合材料表面制备Si C/Mo Si_2抗氧化涂层,并利用SEM、XRD以及EDS等测试手段对抗氧化涂层的组织结构、抗氧化性能和抗氧化机制进行了研究。结果表明,用磁控溅射法制得的涂层结构致密、厚度均匀可控,呈柱状晶。在1500℃静态氧化60 min后涂层试样的氧化质量损失为3.2×10~(-2)g·cm~(-2),涂层表现出优异的抗氧化保护性能。导致C/C基体被氧化失重的主要原因是涂层中沿晶界产生的贯穿裂纹为氧气进入基体表面提供了通道。
The Si C / Mo Si 2 anti-oxidation coating was prepared on the surface of C / C composites by magnetron sputtering. The microstructure, oxidation resistance and oxidation resistance of the anti-oxidation coating were investigated by means of SEM, XRD and EDS Study. The results show that the coating prepared by magnetron sputtering has a dense structure with uniform thickness and columnar crystal structure. After the static oxidation at 1500 ℃ for 60 min, the mass loss of the coating was 3.2 × 10 -2 g · cm -2, and the coating showed excellent oxidation protection. The main reason that the C / C matrix is oxidized and lost weight is that the through crack in the coating along the grain boundary provides a channel for oxygen to enter the surface of the substrate.