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为了精确控制曝光剂量,需要精确测量光刻系统的光学透射率。采用了双光路对比的方法进行透射率测量,有效地消除了准分子激光器能量波动带来的透射率测量误差。并通过加入起偏器,消除了准分子激光器偏振态不稳定带来的误差。搭建了深紫外光学透射率测量装置,对1片可计算透射率的光学样品进行透射率测量,其测量结果与透射率理论计算结果基本一致。测量结果显示,该装置的测量重复性可达到0.3%。通过分光光度计对该光学样品进行测量,通过结果对比,该装置的测量结果与分光光度计的测量结果相差0.28%。另外,该装置应用灵活,可以测量光学系统的透射率,具有不受待测光学样品尺寸影响的优点。
In order to precisely control the exposure dose, it is necessary to accurately measure the optical transmittance of the lithography system. A dual optical path contrast method is used to measure the transmittance, which effectively eliminates the measurement error of transmittance caused by the energy fluctuation of the excimer laser. By adding a polarizer, the error caused by the instability of the excimer laser is eliminated. A deep ultraviolet optical transmittance measuring device was set up to measure the transmittance of one optical sample with calculated transmittance. The measured result is basically consistent with the theoretical calculation of transmittance. Measurement results show that the device can measure repeatability of up to 0.3%. The optical sample was measured by a spectrophotometer. By contrasting the results, the measurement of the device differed from the measurement of the spectrophotometer by 0.28%. In addition, the device is flexible in application and can measure the transmissivity of the optical system with the advantage of being free from the influence of the size of the optical sample to be tested.