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采用空心阴极离子镀方法，分别以Ｔｉ＋ Ａｌ％ 和ＴＣ４作为蒸发材料，在高速钢表面沉积ＴｉＡｌＮ多元超硬膜。结果表明，该镀膜工艺可行，制备出的ＴｉＡｌＮ膜层性能优异，即硬度高、膜层与基体之间结合良好。文中还对膜层的微观组织结构进行了分析。
Hollow cathode ion plating method was used to deposit TiAlN multiple superhard coatings on the surface of HSS with Ti + Al% and TC4 as the evaporation materials respectively. The results show that the coating process is feasible, and the prepared TiAlN film has excellent performance, that is, high hardness and good bonding between the film and the substrate. The paper also analyzed the microstructure of the film.