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A novel and precise micron-scale nanosecond laser spot measurement based on film-scanning method is presented.The method can be used to measure the spot size,beam profile,and intensity distribution of the pulse.The central spot radius of the pulsed Bessel beams with pulse width of 25 ns is measured to be 94.86±5μm in our experiment through the analysis of the digital image by film scanning,and the result is consistent with the theoretical value of 92.33μm.Compared with charge-coupled device/complementary metal oxide semiconductor(CCD/CMOS)laser beam profilers,the film-scanning method shows higher measurement accuracy,single shot ultrashort pulse measurable,larger measurable size,and wider measur- able wavelength range.
A novel and precise micron-scale nanosecond laser spot measurement based on film-scanning method is presented. The method can be used to measure the spot size, beam profile, and intensity distribution of the pulse. The central spot radius of the pulsed Bessel beams with pulse width of 25 ns is measured to be 94.86 ± 5 μm in our experiment through the analysis of the digital image by film scanning, and the result is consistent with the theoretical value of 92.33 μm. Compared with charge-coupled device / complementary metal oxide semiconductor (CCD / CMOS) laser beam profilers, the film-scanning method shows higher measurement accuracy, single shot ultrashort pulse measurable, larger measurable size, and wider measurrable wavelength range.