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应用空心阴极离子镀膜技术，制备了纯铬薄膜样品。样品可在不同的温度和时间下进行退火处理。同时应用椭圆偏振测量术的多角入射法对Ｃｒ薄膜氧化层的厚度进行了测定，讨论了退火温度和退火时间对其氧化的影响。
Hollow-cathode coating technology was used to prepare pure chromium film samples. Samples can be annealed at different temperatures and times. At the same time, the thickness of Cr oxide layer was measured by ellipsometry and multi-angle method. The effects of annealing temperature and annealing time on the oxidation of Cr oxide were discussed.