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采用磁控溅射交替溅射WS2和石墨靶,在200℃的Si基体上制备了不同调制比的WS_x/a-C多层膜(调制周期约为20 nm).利用扫描电镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)、X射线光电子谱(XPS)等手段表征了多层膜的微观结构;采用纳米压痕仪、薄膜应力测试仪、涂层附着力划痕仪和球盘式摩擦磨损试验机测试多层膜的机械性能及大气中的的摩擦磨损性能.结果表明:WS_x/a-C多层膜表面平整、结构致密,S/W比在0.92~0.97范围内波动,WS_x子层以微晶的形式存在,WS_x/a-C相界面处形成了WC相.随着调制比的增加,多层膜的硬度由7.8 GPa升高至9.0GPa,膜内压应力先减小后增大,结合力单调减小,摩擦系数由0.18增至0.29,磨损率迅速升高.调制比为1∶39的多层膜的摩擦学性能最佳,其磨损率约为6.1×10~(–15) m~3/(N·m).
The WS_x / aC multilayers with different modulation ratio (about 20 nm) were prepared on Si substrates at 200 ℃ by sputtering sputtered WS2 and graphite targets alternately. The scanning electron microscopy (SEM) (EDS), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were used to characterize the microstructure of the multilayered films. Nanoindenter, film stress tester, The mechanical properties of multi-layer film and the friction and wear properties in the air were tested by ball-and-disk friction and wear testing machine.The results showed that the surface of WS_x / aC multilayers was smooth and compact with S / W ratio fluctuating in the range of 0.92-0.97, The WS_x sub-layer exists in the form of microcrystals, and the WC phase forms at the interface of WS_x / aC phase. With the increase of the modulation ratio, the hardness of multi-layer film increases from 7.8 GPa to 9.0 GPa, The friction coefficient increased from 0.18 to 0.29, the wear rate increased rapidly.The multilayers with the modulation ratio of 1:39 had the best tribological properties with the wear rate of about 6.1 × 10 ~ (-1) -15) m ~ 3 / (N · m).