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原子光刻技术可以制备高重复性的铬原子纳米条纹光栅,这种光栅可以作为纳米节距标准,实现对高精度的扫描探针式显微镜、电子显微镜等高端仪器的校准。高真空腔体中的固态铬原子受高温喷发出气态原子束,运动的原子束在冷却激光场和激光驻波场的分别作用下,实现原子束的准直与汇聚,沉积在位于激光驻波场后面的InP基片上。经过3h的堆积,得到间距为212.78nm,高度为9nm的铬原子纳米条纹光栅。针对条纹生长速率较慢的问题,分析了具体原因,为后续工作提供参考。
Atomic lithography can be used to fabricate highly repetitive chromium atom nanometer stripe grating, which can be used as the standard of nanometer pitch to calibrate high-precision scanning probe microscope, electron microscope and other high-end instruments. The solid-state chromium atoms in the high-vacuum chamber are ejected by high-temperature gaseous atom beams. The moving atom beams are collimated and converged by the cooling laser field and the laser standing wave field, respectively, and are deposited on the laser standing waves Field behind the InP substrate. After 3h of deposition, a pitch of 212.78nm, a height of 9nm chromium atomic nanometer stripe grating. In view of the problem that the growth rate of streaks is relatively slow, the specific reasons are analyzed and the references for the follow-up work are provided.