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对多弧离子镀ＴｉＮ涂层的工艺（包括氮分区、弧靶啼场、弧源电流）进行了正交设计分析．表明，影响ＴｉＮ涂层表面硬度的主要因素为氮分压和弧靶磁场大小，弧流大小为次要因素．氮分压对ＴｉＮ涂层的相结构影响较大，而弧靶磁场影响电弧运动的稳定性以及涂展表面粗大颗粒的大小．另外，在其它工艺条件相同的情况下，随着氮分区、弧靶磁场的增大，ＴｉＮ涂层的耐磨性均有提高．
The multi-arc ion plating TiN coating process (including nitrogen partition, arc target cryogenic field, arc source current) were orthogonal design and analysis. It is indicated that the main factors that affect the surface hardness of TiN coating are the partial pressure of nitrogen and the magnetic field of arc target, and the size of arc current is the secondary factor. The partial pressure of nitrogen has a great influence on the phase structure of TiN coating, but the arc target magnetic field affects the stability of arc movement and the size of coarse particles on the coated surface. In addition, under the same conditions, the wear resistance of TiN coatings increased with the increase of nitrogen partitioning and arc magnetic field.