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采用RF-PECVD与磁控溅射复合技术制备了MoSx掺杂的DLC(a-C:H:Mo:S)薄膜,并对其组成、表面形貌、纳米硬度及热稳定性进行了分析.在QG-700摩擦试验机上考察了其在不同滑动速度下的摩擦行为.通过对摩擦表面的光学显微观察、扫描电镜(SEM)观察及能谱(EDS)分析,简单探讨了其摩擦磨损机理.结果表明:随着速度的增加,a-C:H:Mo:S/Si3N4体系的摩擦系数先升高后降低,而磨损率则表现出相反的变化趋势.分析认为摩擦系数的升高与高湿度下薄膜表面的氧化反应有关,而降低则主要是由于石墨化所致.
The MoSx-doped DLC (aC: H: Mo: S) thin films were prepared by RF-PECVD and magnetron sputtering technique, and their composition, surface morphology, nanohardness and thermal stability were analyzed. -700 friction tester was used to study the frictional behavior at different sliding velocities.The mechanism of friction and wear was simply discussed by optical microscopy, scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) analysis.The results The results show that the friction coefficient of aC: H: Mo: S / Si3N4 system firstly increases and then decreases with the increase of the velocity, while the wear rate shows the opposite trend.The analysis shows that the friction coefficient increases with the increase of the film thickness under high humidity Surface oxidation reaction, while the decrease is mainly due to graphitization.