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近几年来出现了从光刻掩模的制造到光致抗蚀剂的去除整个工艺程序中用电子束制版,离子技术去胶等一系列新技术,有可能取代用乳胶干版制造掩模的工艺。但是由于设备昂贵,某些器件的特殊要求完全取代至少在目前是不可能。新技术无疑是为人们欢迎的但距离普及使用还存在困难,因而掩模制造工艺在目前和一个相当长的时间内仍然会在微电子工业中,成为一项关键工艺而发挥它应有的作用。 乳胶干版尽管在光敏组份方面作了某些调整,但基本工艺差别并不十分明显,然而,在于版质量方面例如S度分辨率等则有一定的差异。因此,直接影响到器件和电路掩模版的制作,特别是做细图形的加工。几乎所有的器件、电路的制造者都希望能得到解相力高、图形清晰、无缺陷的光刻掩模。 本所在研制微波器件中,相当多地采用圆形点阵结构,因为在制版照相中圆点要比相同尺寸条件下的线条困难得多,我们曾试图采用电子束曝光机来制备。由于目前采用逐步逼进法扫描作图,制作圆形点阵则带来困难和极大的复杂性一时是不能实现的,因此也迫使我们对乳胶干版作一些工作,当务之急的是实现2微米(相当于1微米线条)直径的圆点,分辨率能否满足?为了避免不必要的重复,我们仅提出以下几方面共同讨论。 1.光晕、光渗对分辨率的影响
In recent years, there have been a series of new technologies from lithography mask fabrication to photoresist removal through electron beam lithography and ion-exchange technology in the entire process sequence. It is possible to replace the mask making with latex masterbatch Process. However, due to the high cost of equipment, the complete replacement of the special requirements of certain devices is not possible at least for now. While new technologies are undoubtedly popular but difficult-to-use widespread applications, the mask manufacturing process is and will remain a key process in the microelectronics industry for a long time to come into play . Although the dry emulsion version of the photosensitive component made some adjustments, but the basic process is not very different, however, there are some differences in the quality aspects such as S-resolution. Therefore, a direct impact on the production of devices and circuit mask, in particular, do fine graphics processing. Almost all devices, circuit manufacturers want to get a high resolution, clear graphics, defect-free lithography mask. We developed a microwave device, the use of a lot of circular lattice structure, because in the photographic plate in the dot size than the same conditions much more difficult, we have tried to use electron beam exposure machine to prepare. Due to the current step-by-step scan mapping, the difficulty and complexity of making circular dots is unimaginable at a time, and therefore forcing us to do some work on latex dry sheets, it is imperative that the 2 micron (Equivalent to 1 micron lines) diameter dot, the resolution can meet? In order to avoid unnecessary duplication, we only put forward the following aspects to be discussed together. 1. Halo, light penetration on the resolution of the impact