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本文介绍了一种简单的热壁外延(HWE)装置,和利用它在BaF_2(111)衬底上生长PbTe(111)单晶薄膜的工艺,并讨论了生长机理.
In this paper, we introduce a simple thermal wall epitaxy (HWE) device and the process of growing PbTe (111) single crystal film on BaF_2 (111) substrate. The growth mechanism is also discussed.