Effects of Unintended Dopants on I-V Characteristics of the Double-Gate MOSFETs,a Simulation Study

来源 :Communications in Theoretical Physics | 被引量 : 0次 | 上传用户:lzy19900924
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In this paper, we study the effects of an unintended dopant in the channel on the current-voltage char-acteristics of a Double-Gate (DG) Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). Non-Equilibrium Green's Function (NEGF) approach is used. A quantum transport model to calculate the drain current is presented and subthreshold swing and drain induced barrier lowering (DIBL) effect are studied. In this paper, we study the effects of an unintended dopant in the channel on the current-voltage char-acteristics of a Double-Gate (DG) Metal-Oxide-Semiconductor Field-Effect Transistor A quantum transport model to calculate the drain current is presented and the subthreshold swing and drain induced barrier lowering (DIBL) effect are studied.
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