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以Ge单晶抛光片为衬底的空间太阳电池在我国的应用已越来越多。目前,抛光后Ge单晶片的几何参数,尤其是表面状态常不能满足使用要求。介绍了超薄Ge衬底片抛光的工艺技术,开展了抛光压力、抛光盘转速与抛光去除速率的关系实验,对影响Ge单晶抛光片几何参数和表面质量的原因进行了分析和实验研究。工艺优化后抛光的产品完全满足了空间高效太阳电池的衬底的使用要求。
Ge single crystal polishing substrate for the space solar cells in our application has been more and more. At present, the geometric parameters of the polished Ge single crystal, especially the surface state, often can not meet the requirements. The technology of polishing the ultra - thin Ge substrate was introduced. The relationship between the polishing pressure, polishing speed and polishing removal rate was studied. The reasons that affect the geometrical parameters and the surface quality of the Ge single crystal polishing substrate were analyzed and experimentally studied. Polished products optimized for the process to fully meet the space efficient use of solar cell substrate requirements.