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江苏省冶金研究所研制的 B1低阻合金靶材,于5月13日在南京通过冶金部、电子部的联合鉴定。B1低阻靶材是供八十年代从美国引进的 TRC2020型磁控溅射镀膜机生产金属膜电阻用的原材料,这种靶材过去一直靠国外进口,且价格昂贵。会上,经有关专家、使用单位鉴定,一致认为:B1低阻靶材符合溅射设备工艺性能要求,所生产的电阻元件各项性能
B1 low-resistance alloy target developed by Jiangsu Institute of Metallurgy, on May 13 in Nanjing through the Ministry of Metallurgy, the Ministry of Electronics joint identification. B1 low-resistance target material is used for the production of metal film resistors for the TRC2020 magnetron sputtering coating machine introduced from the United States in 1980s. In the past, such targets have been imported from abroad and are expensive. At the meeting, the experts, the use of units identified, agreed that: B1 low-impedance target sputtering equipment in line with technological performance requirements, the performance of the resistance components produced