【摘 要】
：
Plasmonic nanolaser as a new type of ultra-small laser,has gain wide interests due to its breaking diffraction limit of light and fast carrier dynamics characters.Normally,the main problem that need to be solved for plasmonic nanolaser is high loss induce
【机 构】
：
College of Electronic and Optical Engineering,Nanjing University of Posts and Telecommunications,Nan
论文部分内容阅读
Plasmonic nanolaser as a new type of ultra-small laser,has gain wide interests due to its breaking diffraction limit of light and fast carrier dynamics characters.Normally,the main problem that need to be solved for plasmonic nanolaser is high loss induced by optical and ohmic losses,which leads to the low quality factor.In this work,InGaN/GaN nanoplate plasmonic nanolaser with large interface area were designed and fabricated,where the overlap between SPs and excitons can be en-hanced.The lasing threshold is calculated to be ～6.36 kW/cm2,where the full width at half maximum (FWHM) drops from 27 to 4 nm.And the fast decay time at 502 nm (sharp peak of stimulated lasing) is estimated to be 0.42 ns.Enhanced lasing charac-ters are mainly attributed to the strong confinement of electromagnetic wave in the low refractive index material,which im-prove the near field coupling between SPs and excitons.Such plasmonic laser should be useful in data storage applications,bio-logical application,light communication,especially for optoelectronic devices integrated into a system on a chip.
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