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通过对嫁接接合部位电阻的检测发现，接合部位电阻的变化与其组织学的变化相关。亲和性组合，电阻的变化可分为４ 个阶段：电阻略微下降阶段（嫁接后几小时）；电阻快速升高阶段（嫁接后几小时到２ ｄ 左右）；电阻逐渐下降阶段（约为嫁接后２—６ ｄ）和电阻趋于平稳并恢复到嫁接前水平阶段（嫁接６ ｄ 以后）。非亲和性组合，电阻的变化有３ 种情况：（１） 嫁接后第一天，电阻持续升高至最高点，此后，直至接穗萎蔫，电阻只是略微下降；（２） 嫁接１ ｄ 电阻持续升高后，２—３ ｄ 内很快下降，接着电阻逐渐上升；（３） 与（２）类似，只在后期，电阻很快上升。电阻法是一种新的检测嫁接植株形成过程和预测嫁接亲和性的方法
The resistance of the grafted junction was detected by the change of resistance of the junction and its histological changes. Affinity combination, resistance changes can be divided into four stages: a slight decline in resistance stage (hours after grafting); resistance rapid increase stage (several hours after grafting to about 2d); resistance gradually decline stage (about grafting After 2-6 d) and the resistance tended to stabilize and returned to the pre-grafting stage (after 6 days of grafting). Non-affinity combinations, the resistance changes in three cases: (1) the first day after grafting, the resistance continued to rise to the highest point, thereafter, until the scion wilt resistance only slightly decreased; (2) grafting 1 d resistance continued After 2-3 d, the resistance drops rapidly and then the resistance gradually increases. (3) Similar to (2), the resistance rises rapidly only in the late stage. Resistance method is a new method to detect the formation of grafted plants and predict the affinity of grafts