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在６０℃和常压下，电解甲醇和脲的混合溶液在硅基片上沉积ＣＮｘ薄膜．傅里叶红外和Ｒａｍａｎ测试表明，所得薄膜是非晶态的，碳和氮主要是以Ｃ—Ｎ，Ｃ—Ｃ，ＣＣ和ＣＮ的形式成键，有少量的碳和氮以ＣＮ的形式成键．Ｘ射线光电子能谱测试表明，氮是以ＳＰ２和ＳＰ３杂化形式与碳化学成键来成膜的．测试结果表明通过液相沉积法所得ＣＮｘ薄膜与汽相沉积法所得ＣＮｘ薄膜的结构比较接近
A CNx thin film was deposited on a silicon substrate by electrolysis of a mixed solution of methanol and urea at 60 ° C. under normal pressure. Fourier transform infrared (FTIR) and Raman measurements showed that the obtained films were amorphous and carbon and nitrogen were mainly in the form of C-N, C-C, CC and CN with a small amount of carbon and nitrogen as CN bonds . X-ray photoelectron spectroscopy test showed that nitrogen is formed by chemical bonding with carbon by SP2 and SP3 hybridization. The test results show that the structures of CNx thin films obtained by the liquid deposition method and the CNx thin films obtained by the vapor deposition method are relatively close