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激光技术已广泛应用于微电子领域大规模集成电路生产的各个环节。本文以激光全息光刻、激光全息掩模和激光干涉成像光刻为切入点，对激光全息用于微电子领域的潜力作一分析。
Laser technology has been widely used in all aspects of the production of large-scale integrated circuits in the field of microelectronics. In this paper, laser holographic lithography, laser holographic mask and laser interferometric imaging lithography as the starting point for the laser holographic potential for microelectronics to make an analysis.