采用有机改性硅酸盐制备了光敏性溶胶 -凝胶 ,并在凝胶中加入四丙氧基锆作为调节折射率的材料 ;用该凝胶在硅片上提拉成膜 .为了增加薄膜与硅片的粘附性 ,成膜前先用干氧热氧化法在硅片上生长了一层厚度约为 15 0 0 的二氧化硅 ;样品的原子力相片表明薄膜的表面非常平整 ,在 5× 5 μm2 的范围内最大表面起伏只有 0 .6 5 7nm 利用波导阵列掩膜版 ,对制备的薄膜在紫外光波段下曝光 ,得到了表面平坦、侧墙光滑、陡直的沟道波导阵列 研究发现 :紫外曝光时间和坚膜时的后烘温度都会使薄膜的折射率增大 .通过对样品红外吸收谱的分析 ,从微观机理上解释了折射率随工艺条件变化的原因 The photosensitive sol-gel was prepared by organically modified silicate, and tetrapropoxyzirconium was added as a material for adjusting the refractive index in the gel. The gel was used to lift and form a film on a silicon wafer. In order to increase the film thickness, And the adhesion of the silicon film before the film dry oxide thermal oxidation method on the silicon layer is grown on a layer of silicon dioxide thickness of about 1500; atomic force photographs of the sample showed that the film surface is very smooth, 5 × 5 μm2 maximum surface roughness only 0.657nm Waveguide array mask plate, the prepared film was exposed in the ultraviolet wavelength band, resulting in a smooth surface, the sidewall smooth and steep trench waveguide array research It is found that the refractive index of the film increases with the UV exposure time and the post-baking temperature of the film.Analyzing the infrared absorption spectrum of the sample, the reason why the refractive index changes with the process conditions is explained from the microscopic mechanism