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The (200) dominated (Nd∶LuVO_4) films were fabricated successfully on polished SiO_2 under different ambient gases and different oxygen pressures. By XRD, it is shown that a film with good crystallization is deposited under oxygen and the optimal pressure is 20 Pa. The surface morphology of (Nd∶LuVO_4) films was observed by AFM, and it is found that oxygen pressure influences the surface morphology of (Nd∶LuVO_4) films. The ratio of content of (Nd∶LuVO_4) films was estimated according to the yields of Lu and V by using RBS spectra, this ratio is in good agreement with the target composition. The effective index refractive of every mode is 2.0044, 17098, measured by prism coupler method.
The (200) dominated (Nd: LuVO_4) films were fabricated successfully on polished SiO_2 under different ambient gases and different oxygen pressures. By XRD, it is shown that a film with good crystallization is deposited under oxygen and the optimal pressure is 20 Pa. The surface morphology of (Nd: LuVO_4) films was observed by AFM, and it is found that oxygen pressure influences the surface morphology of (Nd: LuVO_4) films was estimated according to the yields of Lu and V by using RBS spectra, this ratio is in good agreement with the target composition. The effective index of refractive of every mode is 2.0044, 1.7098, measured by prism coupler method.