俄罗斯COPAH强化物理学和材料学研究院Meuchep C.H.等人,借助逆散射电子绕射法,研究TiNi合金近表面层经中等能量Si离子流照射后微结构变化规律,发现其表面层特征如下:(1)在具有高相浓度的碎化晶粒内和相边界,存在B19’马氏体相;(2)晶粒碎片长度大于1μm;(3)在Si离子流照射下,近表面层细 Mechchep CH et al., COPAH Institute of Intensive Physics and Materials Science, Russia, studied the microstructure of the TiNi alloy near the surface after irradiation with moderate energy Si ions by means of inverse scattering electron diffraction and found that the surface layer characteristics are as follows: 1) presence of a B19 ’martensite phase within the grain boundaries and phase boundaries with high phase concentration; (2) the length of the grain fragments is greater than 1 μm; (3)