本论文研制了在Ar+O_2混合气氛中Al靶和Al-Y靶的直流磁控反应溅射中氧分压、总气压、溅射电压、电流、功率以及薄膜沉积速率等参数间的相互关系,用电子探针、X射线光电子能谱和俄歇电子能谱手段分析了溅射膜的成分和组元的化学态,用光学显微镜、扫描电镜、透射电镜观察了膜的微观结构,用电子衍射和X射线衍射等方法分析了 In this paper, the relationship between oxygen partial pressure, total pressure, sputtering voltage, current, power and film deposition rate in DC magnetron reactive sputtering of Al target and Al-Y target in a mixed atmosphere of Ar + O 2 The chemical composition of the sputtered film and the chemical state of the element were analyzed by means of electron probe, X-ray photoelectron spectroscopy and Auger electron spectroscopy. The microstructure of the film was observed by optical microscope, scanning electron microscope and transmission electron microscope. Diffraction and X-ray diffraction methods such as analysis