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介绍了一台用于表面分析的饿歇电子能谱仪(AES)系统。用该系统研究了铜快离子导体CuI-Cu_2O-MoO_3-P_2O_5在AES的探针电子诱导下铜沉积的规律;并发现在这种样品表面,部分氧在电子轰击过程中被蒸发而减少,总的二次电子发射电流由于铜沉积在样品表面上面随电子轰击时间迅速改变。
A starvation electron spectrometer (AES) system for surface analysis is presented. The system was used to study the copper deposition under the electron probe-induced CuI-Cu_2O-MoO_3-P_2O_5, which is a copper fast ion conductor. It was found that on the surface of this sample, part of the oxygen was evaporated and decreased during the electron bombardment. The secondary electron emission current rapidly changes with electron bombardment time due to copper deposition on the sample surface.