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在低温和常压下，通过电解甲醇和氨水混合溶液，在硅基片上进行沉积掺氮碳膜的尝试，得到了含氮8％的类金刚石薄膜。通过拉曼光谱和X光电子能谱对样品的测试表明：碳和氨在薄膜中是以SP2和SP3进行化学成键的。本文还提出了液相掺氮碳膜生长的化学机制。
At low temperature and pressure, an attempt was made to deposit a nitrogen-doped carbon film on a silicon substrate by electrolyzing a mixed solution of methanol and ammonia to obtain a diamond-like carbon film containing 8% of nitrogen. The samples tested by Raman spectroscopy and X-ray photoelectron spectroscopy showed that carbon and ammonia were chemically bonded in SP2 and SP3 films. This paper also proposed the chemical mechanism of liquid nitrogen-doped carbon film growth.