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利用HF蚀刻和热处理,结合原子力显微(AFM)分析,对传统抛光和磁流变抛光的表面结构进行了表征。为了分析热处理凸起的形成源,抛光表面在热处理前分别采用超声清洗、化学沥滤和HF蚀刻三种不同的表面处理技术进行处理,去除了不同表面材料。蚀刻形貌和热处理形貌及其关联性表明,传统抛光表面存在着大量纳米级缺陷,这些缺陷由易于诱导激光损伤的纳米级微裂纹和颗粒状分布的抛光杂质组成。结合抛光机制的分析,建立了传统抛光表面的微裂纹-颗粒杂质结构模型。
The surface structures of conventional polishing and MRF were characterized by HF etching and heat treatment combined with atomic force microscopy (AFM) analysis. In order to analyze the formation of heat treatment bumps, the polished surfaces were treated with three different surface treatment technologies: ultrasonic cleaning, chemical leaching and HF etching before heat treatment, respectively, to remove the different surface materials. Etching and heat treatment topographies and their correlations show that there are a large number of nano-scale defects on the conventional polished surfaces, which are composed of nano-scale microcracks that tend to induce laser damage and polished impurities distributed in the form of particles. Combined with the analysis of the polishing mechanism, a model of the micro-crack-particle impurity structure of the traditional polishing surface was established.