The aim of this work was to evaluate the electrochemical behaviour of hypoeutectic Al-Cu alloys immersed in two different solutions containing sulphate and chloride ions,respectively.The influence of Al2Cu associated to the dendritic arm spacing on the general corrosion resistance of such alloys is analysed.The typical microstruc-tural pattern was examined by using scanning electron microscope.The corrosion tests were performed in both 0.5 M sulphuric acid and 0.5 M NaCl solutions at 25°C by using an electrochemical impedance spectroscopy(EIS)technique and potentio-dynamic polarization curves.Equivalent circuits by using the ZView software,were also used to provide quantitative support for the discussions.It was found that as the Cu content increased(i.e.,increasing the Al2Cu fraction),a higher susceptibility to the corrosion action in the NaCl solution is detected.In contrast,the tests carried out in the H2SO4 solution resulted in similar corrosion rates for the three di?erent hypoeutectic alloys. The aim of this work was to evaluate the electrochemical behavior of hypoeutectic Al-Cu alloys immersed in two different solutions containing sulphate and chloride ions, respectively. The influence of Al2Cu associated to the dendritic arm spacing on the general corrosion resistance of such alloys is analysed The typical microstruc-tural pattern was examined by using scanning electron microscope. The corrosion tests were performed in both 0.5 M sulphuric acid and 0.5 M NaCl solutions at 25 ° C. by using an electrochemical impedance spectroscopy (EIS) technique and potentio-dynamic polarization. curves. Equivalent circuits by using the ZView software, were also used to provide quantitative support for the discussions. It was found that as the Cu content increased (ie, increasing the Al2Cu fraction), a higher susceptibility to the corrosion action in the NaCl solution is detected. contrast, the tests carried out in the H2SO4 solution resulted in similar corrosion rates for the three di? erent hypoeu tectic alloys.