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本文在大岩元、俊藤英一、Preiffer和陈仲玮等人的基础上,系统地研究了扫描电子束曝光机的磁复合物镜,提出了三级近似的广义变轴物镜概念(GVAL)。本文结果概括了MOL、VAL和SOL系统并将直线轴变轴系统推广到任意曲线曲变轴系统。最后讨论了实现广义变轴系统的条件和可能性,并为此研制了根据轴上磁场分布设计磁偏转器(线圈)结构的计算机辅助设计程序。一个实际的计算机模拟结果表明,在10×10mm大扫描场边角处的象差经动态校正后可小于0.2 μm(计算条件为加速电压20000V,能量色散2.5eV,半孔径角5.0mr),象面入射角为零,亦即垂直入射,而且物象面间距比一般的复合物镜缩短一倍以上,只有120mm。
This paper systematically studies the magnetic composite objective lens of scanning electron beam lithography machine based on Dayu Yuan, Jun Teng-I, Preiffer and Chen Zhongwei, and proposes the generalized variable-axis objective concept (GVAL) of third-order approximation. The results of this paper summarize the MOL, VAL and SOL systems and generalize the linear axis variable axis system to any curved curve axis system. Finally, the conditions and possibilities of realizing a generalized variable-axis system are discussed, and a computer-aided design procedure for designing a magnetic deflector (coil) structure based on the magnetic field distribution on the shaft is developed. An actual computer simulation shows that aberrations at the corner of a 10 × 10 mm scanning field can be less than 0.2 μm after dynamic correction (calculation conditions are acceleration voltage 20000 V, energy dispersion 2.5 eV and half aperture angle 5.0 mr) Surface incidence angle is zero, which is perpendicular to the incident, and the image plane spacing shorter than the average composite objective more than doubled, only 120mm.