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研究了氮离子注入CVD金刚石薄膜的场电子发射行为 .实验表明 ,稳定发射的形成过程基本具有规律性的击穿、激活和稳定发射三阶段特征 ,并提出了一种修正的激活模型 ,解释了实验结果 ,讨论了发射机理 .
The field electron emission behavior of nitrogen-implanted CVD diamond films was investigated. The experimental results show that the formation of stable emission basically has the regular three-phase characteristics of breakdown, activation and stable emission. A modified activation model is proposed to explain the The experimental results discuss the launch mechanism.