采用脉冲激光沉积(PLD)法在不同氧分压下于LaAlO3(100)基片上成功制备了SrTiO3(STO)薄膜。通过测试,表征了薄膜的微观结构、表面形貌和光学特性。研究表明,对于利用PLD法制备STO薄膜,氧分压是重要的工艺参数。随着氧分压的降低,薄膜的结晶性变好,并发生由立方晶系到四方晶系的形变;氧分压升高,薄膜晶粒尺寸变大、数目变少,薄膜的厚度减小。薄膜在400~2500 nm的可见光和红外波段呈现较低的光学吸收。在5,10和15 Pa氧压下制备的STO薄膜的能隙宽度分别约为3.84,4.13和4.05 eV。这为STO薄膜进一步的制备与分析提供了良好的实验数据支持。 The SrTiO3 (STO) thin films were successfully deposited on LaAlO3 (100) substrates by pulsed laser deposition (PLD). Through the test, the microstructure, surface morphology and optical properties of the films were characterized. The research shows that the partial pressure of oxygen is an important process parameter for the preparation of STO films by PLD. As the oxygen partial pressure decreases, the crystallinity of the film becomes better and the deformation from the cubic system to the tetragonal system occurs. As the partial pressure of oxygen increases, the film grain size becomes larger and smaller, the thickness of the thin film decreases . The films exhibit lower optical absorption in the visible and infrared bands at 400-2500 nm. The STO films prepared at 5, 10 and 15 Pa oxygen pressure have an energy gap of about 3.84, 4.13 and 4.05 eV, respectively. This provides good experimental data support for the further preparation and analysis of STO films.